Manuscript Deadline: November 1, 2024
This special topic collection is planned in collaboration with ALD/ALE 2024. The Special Topic Collection will feature sections dedicated to the science and technology of atomic layer controlled deposition and to the science and technology of controlled etching of thin films. While a significant fraction of the articles is expected to be based on material presented at ALD/ALE 2024, research articles on ALD and ALE but not presented at this conference are also welcome. The special topic collection will be open to all articles on the science and technology of ALD and ALE.
Papers will be reviewed using the same criteria as regular JVST articles and must meet JVST standards for both technical content and written English. To be published in JVST, the manuscript must:
- Present original findings, conclusions or analysis that have not been published previously
- Be free of errors and ambiguities,
- Support conclusions with data and analysis,
- Be written clearly, and
- Have high impact in its field.
Authors are encouraged to use the JVST templates. The easiest way to prepare your manuscript is to use the available JVST Article Template to delete and replace text as necessary. This file and the template used to create it are available at the site above. Online, you will have an opportunity to tell us that your paper is a part of the special issue by choosing “ALD Special Issue or ALE Special Issue.”
Acceptable manuscript file types are MSWord, LaTeX, and PDF. For the initial submission/review process, a single PDF or MSWord file including the figures is sufficient. However, once a paper is accepted, MSWord or TeX file of the text, any tables and the list of figure captions along with the separate figure files will be required for final production. Use of color in Figures is encouraged. Your FIGURES CAN APPEAR ONLINE IN COLOR FOR FREE. Prepare illustrations in the final published size, not oversized or undersized.
Note: all papers, late or not will go to the Collection.
- Atomic Layer Deposition (ALD)
- Thin films
- Atomic Layer Etching (ALE)
- Plasma processing
- Semiconductor device fabrication
- Chemisorption Physisorption
- Materials treatment
Submissions must be submitted on the appropriate technique-specific template. For returning authors, please note that all SSS templates have recently been updated. Please be sure to use the version of the appropriate template that is currently posted online.
Please submit through the online submission system. Online, you will have the opportunity to indicate that your submission is part of this Special Topic Collection by choosing “Atomic Layer Deposition ALD) and Atomic Layer Etching (ALE) ”.