Overview
The AVS 24th International Conference on Atomic Layer Deposition (ALD 2024) featuring the 11th International Atomic Layer Etching Workshop (ALE 2024) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. The conference will take place Sunday, August 4-Wednesday, August 7, 2024, at the Messukeskus in Helsinki, Finland.
Welcome Reception
A Welcome Reception will be held on Sunday from 6:00 p.m-8:00 p.m.
at the Messukeskus Helsinki Expo and Convention Centre, Hall 3 for registered attendees and exhibitors.
As in past conferences, the meeting will be preceded (Sunday, August 4) by one day of tutorials and perspectives and a welcome reception. Sessions will take place (Monday-Wednesday, August 5-7) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 700+. View List of Invited Speakers
How to View the ALD/ALE 2024 Technical Program
The ALD/ALE 2024 Technical Program is now online and there are several easy and convenient ways to view it:
- Mobile App: We recommend downloading the AVS Events & Activities Mobile App following the steps below.
- Online Scheduler: You may also use the Online Scheduler which works well on your desktop/laptop and can be synced to the Mobile App.
Note: log in before creating your schedule if you wish to sync devices. - PDF: You may also view the program as a PDF and/or on signage that will be posted outside each session room door.
Note: this may not be the most updated version of the program.
Opening Remarks: 50 Years of ALD
Dr. Tuomo Suntola
During ALD 2024 we will be celebrating the 50 year anniversary of the groundbreaking work on ALD by Dr. Tuomo Suntola and his coworkers who filed the first patent on Atomic Layer Epitaxy in 1974. Dr. Tuomo Suntola will present the opening remarks of the ALD 2024 conference.
Plenary Speaker
Dr. Ivo J. Raaijmakers, ASM, The Netherlands
Dr. Raaijmakers is currently Corporate Vice President and Executive Advisor of ASM International NV (“ASM”), focusing on innovation management, new technologies and government relations. He started his career in 1982 at the Philips Research Labs in the Netherlands. He moved to the USA in 1988, where he held various positions in semiconductor technology development and R&D management at Philips, Novellus, and Applied Materials. Dr. Raaijmakers joined ASM in 1996 in its ASM America subsidiary and was appointed CTO in 1999, based out of ASM’s headquarter in the Netherlands, a position he held until 2022. Read More
ALE Plenary Speaker
Eric Liu, TEL Technology Center, America, LLC
Eric Liu earned his bachelor’s and master’s degrees in material science and engineering from Penn State University and Cornell University, respectively. He later completed his Ph.D. in Nanoscale Engineering from SUNY Poly. In 2009, he began his career at TSMC and later joined TEL Technology Center, America, LLC in 2015. Currently, he serves as a process engineer manager specializing in patterning for sub-3nm node applications. His research interests include single and multiple pattering methods, process integration, and the demonstration of Design-Technology-Co-Optimization (DTCO). Eric holds over 20 US patents and actively contributes to publications and presentations. Read More
ALD Program Chairs
ALE Program Chairs
Program Chair:
Mikko Ritala
(University of Helsinki, Finland)
Program Co-Chair:
Markku Leskelä
(University of Helsinki, Finland)
Program Chair:
Fred Roozeboom
(University of Twente, The Netherlands)
Program Co-Chair:
Dmitry Suyatin
(AlixLabs AB, Sweden)